Semiconductor package and fabricating method thereof

ABSTRACT

A semiconductor device structure, for example a 3D structure, and a method for fabricating a semiconductor device. As non-limiting examples, various aspects of this disclosure provide various semiconductor package structures, and methods for manufacturing thereof, that comprise interposer, interlayer, and/or heat dissipater configurations that provide for low cost, increased manufacturability, and high reliability.

CROSS-REFERENCE TO RELATED APPLICATIONS/INCORPORATION BY REFERENCE

The present application makes reference to, claims priority to, andclaims the benefit of Korean Patent Application No. 10-2015-0017324,filed on Feb. 4, 2015 in the Korean Intellectual Property Office andtitled “SEMICONDUCTOR PACKAGE AND FABRICATING METHOD THEREOF,” thecontents of which are hereby incorporated herein by reference, in theirentirety.

FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

[Not Applicable]

SEQUENCE LISTING

[Not Applicable]

MICROFICHE/COPYRIGHT REFERENCE

[Not Applicable]

BACKGROUND

Present systems, methods and/or architectures for forming semiconductorpackages are inadequate, for example resulting in excess cost, decreasedreliability, or package sizes that are too large. Further limitationsand disadvantages of conventional and traditional approaches will becomeapparent to one of skill in the art, through comparison of suchapproaches with the present disclosure as set forth in the remainder ofthe present application with reference to the drawings.

BRIEF DESCRIPTION OF SEVERAL VIEWS OF THE DRAWINGS

The accompanying drawings are included to provide a furtherunderstanding of the present disclosure, and are incorporated in andconstitute a part of this specification. The drawings illustrateexamples of the present disclosure and, together with the description,serve to explain various principles of the present disclosure. In thedrawings:

FIG. 1 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure;

FIG. 2 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure;

FIGS. 3A to 3D are cross-sectional views illustrating an example methodof fabricating a semiconductor package, in accordance with variousaspects of the present disclosure;

FIGS. 4A to 4G are cross-sectional views illustrating another examplemethod of fabricating a semiconductor package, in accordance withvarious aspects of the present disclosure;

FIG. 5 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure;

FIG. 6 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure;

FIG. 7 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure;

FIGS. 8A to 8D are cross-sectional views illustrating still anotherexample method of fabricating a semiconductor package, in accordancewith various aspects of the present disclosure;

FIGS. 9A to 9E are cross-sectional views illustrating an additionalexample method of fabricating a semiconductor package, in accordancewith various aspects of the present disclosure;

FIGS. 10A and 10B are cross-sectional views illustrating a furtherexample method of fabricating a semiconductor package, in accordancewith various aspects of the present disclosure;

FIG. 11 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure;

FIG. 12 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure;

FIG. 13 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure;

FIGS. 14A to 14E are cross-sectional views illustrating a still furtherexample method of fabricating a semiconductor package, in accordancewith various aspects of the present disclosure;

FIGS. 15A to 15D are cross-sectional views illustrating yet anotherexample method of fabricating a semiconductor package, in accordancewith various aspects of the present disclosure;

FIG. 16 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure;

FIG. 17 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure;and

FIG. 18 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure.

SUMMARY

Various aspects of this disclosure provide a semiconductor devicestructure, for example a 3D structure, and a method for fabricating asemiconductor device. As non-limiting examples, various aspects of thisdisclosure provide various semiconductor package structures, and methodsfor manufacturing thereof, that comprise interposer, interlayer, and/orheat dissipater configurations that provide for low cost, increasedmanufacturability, and high reliability.

DETAILED DESCRIPTION OF VARIOUS ASPECTS OF THE DISCLOSURE

The following discussion presents various aspects of the presentdisclosure by providing various examples thereof. Such examples arenon-limiting, and thus the scope of various aspects of the presentdisclosure should not necessarily be limited by any particularcharacteristics of the provided examples. In the following discussion,the phrases “for example,” “e.g.,” and “exemplary” are non-limiting andare generally synonymous with “by way of example and not limitation,”“for example and not limitation,” and the like.

As utilized herein, “and/or” means any one or more of the items in thelist joined by “and/or”. As an example, “x and/or y” means any elementof the three-element set {(x), (y), (x, y)}. In other words, “x and/ory” means “one or both of x and y.” As another example, “x, y, and/or z”means any element of the seven-element set {(x), (y), (z), (x, y), (x,z), (y, z), (x, y, z)}. In other words, “x, y and/or z” means “one ormore of x, y, and z.”

The terminology used herein is for the purpose of describing particularexamples only and is not intended to be limiting of the disclosure. Asused herein, the singular forms are intended to include the plural formsas well, unless the context clearly indicates otherwise. It will befurther understood that the terms “comprises,” “includes,” “comprising,”“including,” “has,” “have,” “having,” and the like when used in thisspecification, specify the presence of stated features, integers, steps,operations, elements, and/or components, but do not preclude thepresence or addition of one or more other features, integers, steps,operations, elements, components, and/or groups thereof.

It will be understood that, although the terms first, second, etc. maybe used herein to describe various elements, these elements should notbe limited by these terms. These terms are only used to distinguish oneelement from another element. Thus, for example, a first element, afirst component or a first section discussed below could be termed asecond element, a second component or a second section without departingfrom the teachings of the present disclosure. Similarly, various spatialterms, such as “upper,” “lower,” “side,” and the like, may be used indistinguishing one element from another element in a relative manner. Itshould be understood, however, that components may be oriented indifferent manners, for example a semiconductor device may be turnedsideways so that its “top” surface is facing horizontally and its “side”surface is facing vertically, without departing from the teachings ofthe present disclosure.

Various aspects of the present disclosure provide a semiconductor deviceor package and a fabricating (or manufacturing) method thereof, whichcan decrease the cost, increase the reliability, and/or increase themanufacturability of the semiconductor device.

The above and other aspects of the present disclosure will be describedin or be apparent from the following description of various exampleimplementations.

According to an aspect of the present disclosure, there is provided asemiconductor package including a semiconductor device including acircuit board including an insulating layer, a first circuit patternformed on a top surface of the insulating layer and a second circuitpattern formed on a bottom surface of the insulating layer, asemiconductor die mounted on a top surface of the circuit board, anencapsulant encapsulating the semiconductor die from an upper portion ofthe circuit board and having through vias exposing the first circuitpattern to the outside of the encapsulant, and conductive structures(e.g., conductive bumps or balls, pillars, wires, etc.) formed in thethrough vias and electrically connected to the first circuit pattern, aninterposer mounted on the semiconductor device and including aninsulator, a circuit pattern formed on a bottom surface of the insulatorand conductive structures (e.g., conductive bumps or balls, solderballs, pillars, wires, etc.) formed on the circuit pattern, and aninterlayer member interposed between the semiconductor device and theinterposer, wherein the conductive structures of the interposer areelectrically connected to the conductive structures in the through vias,and the interlayer member is formed to cover the conductive bumps andthe solder balls.

The interlayer member may, for example, be formed of an epoxy flux, anepoxy resin, an epoxy molding compound (EMC), an anisotropicallyconductive paste (ACP), etc.

In addition, the interlayer member may include a first interlayer memberpart covering the conductive bumps and the solder balls and a secondinterlayer member part formed along an outer peripheral edge of thefirst interlayer member part.

The first interlayer member part may, for example, be formed of an epoxyflux and the second interlayer member part may, for example, be formedof an adhesive.

The second interlayer member part may, for example, be formed betweenthe semiconductor die and the interposer and between the encapsulant andthe interposer.

According to an aspect of the present disclosure, there is provided afabricating method of a semiconductor package, including preparing asemiconductor device including a circuit board including an insulatinglayer, a first circuit pattern formed on a top surface of the insulatinglayer and a second circuit pattern formed on a bottom surface of theinsulating layer, a semiconductor die mounted on a top surface of thecircuit board, an encapsulant encapsulating the semiconductor die andhaving through vias exposing the first circuit pattern to the outside ofthe encapsulant, and conductive structures (e.g., conductive bumps orballs, pillars, wires, etc.) formed in the through vias and electricallyconnected to the first circuit pattern, forming an interlayer member onthe semiconductor device, and positioning an interposer on theinterlayer member and performing a reflow process on the interlayermember, the interposer including an insulator, a circuit pattern formedon a bottom surface of the insulator and conductive structures (e.g.,conductive bumps or balls, solder balls, pillars, wires, etc.) formed onthe circuit pattern.

In the performing of the reflow process, the conductive structures inthe through vias may be welded to the conductive structures of theinterposer.

In addition, in the performing of the reflow process, the interlayermember may be cured between the semiconductor device and the interposer.

The interlayer member may cover lateral surfaces of any or all of theconductive structures.

In the forming of the interlayer member, the interlayer member may becoated to entirely cover a top portion of the semiconductor device.

The interlayer member may, for example, be formed of an epoxy flux, anepoxy resin, an epoxy molding compound (EMC), an anisotropicallyconductive paste (ACP), etc.

In the forming of the interlayer member, a first interlayer member partmay be formed on the through vias and a second interlayer member partmay be formed on the semiconductor die and the encapsulant.

The first interlayer member part may, for example, be formed of an epoxyflux and the second interlayer member part may, for example, be formedof an adhesive.

According to still another aspect of the present disclosure, there isprovided a fabricating method of a semiconductor package, includingpreparing a semiconductor device including a circuit board including aninsulating layer, a first circuit pattern formed on a top surface of theinsulating layer and a second circuit pattern formed on a bottom surfaceof the insulating layer, a semiconductor die mounted on a top surface ofthe circuit board, an encapsulant encapsulating the semiconductor diefrom an upper portion of the circuit board and having through viasexposing the first circuit pattern to the outside, and conductivestructures (e.g., conductive bumps or balls, pillars, wires, etc.)formed in the through vias and electrically connected to the firstcircuit pattern, forming a first interlayer member part on thesemiconductor device by coating, positioning an interposer on theinterlayer member and performing a reflow process on the interposer, theinterposer including an insulator, a circuit pattern formed on a bottomsurface of the insulator and conductive structures (e.g., conductivebumps or balls, solder balls, pillars, wires, etc.) formed on thecircuit pattern, and forming a second interlayer member part between thesemiconductor device and the interposer by, for example,injection-molding.

In the forming of the first interlayer member part, the first interlayermember part may be coated on the through vias.

In addition, in the performing of the reflow process, the conductivestructures in the through vias may be welded to the conductivestructures of the interposer and the first interlayer member part maycover lateral surfaces of any or all of the conductive structures.

In the forming of the second interlayer member part, the secondinterlayer member part may, for example, be injected into portionsbetween the semiconductor die and the interposer and between theencapsulant and the interposer.

In the forming of the first interlayer member part, the first interlayermember part may, for example, be formed on the solder balls by dipping.

According to yet another aspect of the present disclosure, there isprovided a semiconductor package including a circuit board including aninsulating layer, a first circuit pattern formed on a top surface of theinsulating layer and a second circuit pattern formed on a bottom surfaceof the insulating layer, a semiconductor die mounted on the circuitboard, an interposer mounted on the circuit board and the semiconductordie and including an insulator, a circuit pattern formed on a bottomsurface of the insulator and a conductive filler formed on the circuitpattern, and an interlayer member interposed between the circuit boardand the interposer, wherein the conductive filler is electricallyconnected to the first circuit pattern and the interlayer member isformed to cover lateral surfaces of the conductive filler.

The interlayer member may, for example, be formed of an epoxy flux, anepoxy resin, an epoxy molding compound (EMC), an anisotropicallyconductive paste (ACP), etc.

In addition, the interlayer member may, for example, include a firstinterlayer member part covering the conductive filler, the first circuitpattern of the circuit board electrically connected to the conductivefiller and the circuit pattern of the interposer and a second interlayermember part formed along an outer peripheral edge of the firstinterlayer member part.

The first interlayer member part may, for example, be formed of an epoxyflux and the second interlayer member part is formed of an adhesive.

The second interlayer member part may, for example, be formed betweenthe semiconductor die and the interposer and between the encapsulant andthe interposer.

In addition, the second interlayer member part may, for example, beformed between the semiconductor die and the interposer.

According to a still further aspect of the present disclosure, there isprovided a fabricating method of a semiconductor package, includingattaching a semiconductor die on a circuit board including an insulatinglayer, a first circuit pattern formed on a top surface of the insulatinglayer and a second circuit pattern formed on a bottom surface of theinsulating layer, forming an interlayer member on the circuit board andthe semiconductor die, for example by coating, and positioning aninterposer on the interlayer member and performing a reflow process onthe interlayer member, the interposer including an insulator, a circuitpattern formed on a bottom surface of the insulator and a conductivefiller formed on the circuit pattern.

In the performing of the reflow process, the conductive filler may beelectrically connected to the first circuit pattern of the circuitboard.

In addition, in the performing of the reflow process, the interlayermember may, for example, be cured between the circuit board and theinterposer.

The interlayer member may, for example, cover the conductive filler, thefirst circuit pattern of the circuit board electrically connected to theconductive filler and the circuit pattern of the interposer.

In addition, the interlayer member may, for example, be formed of anepoxy flux, an epoxy resin, an epoxy molding compound (EMC), ananisotropically conductive paste (ACP), etc.

In the forming of the interlayer member, a first interlayer member partmay, for example, be formed on the first circuit pattern and a secondinterlayer member part may, for example, be formed on the semiconductordie.

The first interlayer member part may, for example, be formed of an epoxyflux and the second interlayer member part may, for example, be formedof an adhesive.

According to still further aspect of the present disclosure, there isprovided a fabricating method of a semiconductor package, includingattaching a semiconductor die on a circuit board including an insulatinglayer, a first circuit pattern formed on a top surface of the insulatinglayer and a second circuit pattern formed on a bottom surface of theinsulating layer, forming a first interlayer member part on the circuitboard, for example by coating, positioning an interposer on theinterlayer member and performing a reflow process on the interlayermember, the interposer including an insulator, a circuit pattern formedon a bottom surface of the insulator and a conductive filler formed onthe circuit pattern, and forming a second interlayer member part betweenthe circuit board and the interposer, for example by injection-molding.

In the forming of the first interlayer member part, the first interlayermember part may, for example, be coated on the first circuit pattern ofthe circuit board.

In the performing of the reflow process, the conductive filler may, forexample, be electrically connected to the first circuit pattern and thefirst interlayer member part may, for example, cover the conductivefiller, the first circuit pattern of the circuit board electricallyconnected to the conductive filler and the circuit pattern of theinterposer.

In the forming of the second interlayer member part, the secondinterlayer member part may, for example, be injected into portionsbetween the semiconductor die and the interposer and between the circuitboard and the interposer.

According to a still further aspect of the present disclosure, there isprovided a semiconductor package including a semiconductor deviceincluding a circuit board including an insulating layer, a first circuitpattern formed on a top surface of the insulating layer and a secondcircuit pattern formed on a bottom surface of the insulating layer, asemiconductor die mounted on a top surface of the circuit board andhaving a metal layer formed thereon, an encapsulant encapsulating thesemiconductor die from an upper portion of the circuit board and havingthrough vias exposing the first circuit pattern to the outside, andconductive structures (e.g., conductive bumps or balls, pillars, wires,etc.) formed in the through vias and electrically connected to the firstcircuit pattern, an interposer mounted on the semiconductor device andincluding an insulator, a circuit pattern formed on a bottom surface ofthe insulator and conductive structures (e.g., conductive bumps orballs, solder balls, pillars, wires, etc.) formed on the circuitpattern, and a heat radiating member disposed between the semiconductordie and the interposer, where the heat radiating member is electrically(or at least heat-conductively) connected to the metal layer and theinterposer (e.g., a conductive pad formed thereon).

The heat radiating member may, for example, be formed of a solder paste(e.g., at least initially, prior to a reflow process if performed).

The semiconductor package may, for example, further include aninterlayer member between the semiconductor device and the interposer.

The interlayer member may, for example, be formed between theencapsulant and the interposer.

According to still another aspect of the present disclosure, there isprovided a semiconductor package including an interposer including aninsulator, a circuit pattern and conductive pads formed on a top surfaceof the insulator and conductive structures (e.g., conductive bumps orballs, solder balls, pillars, wires, etc.) formed on the circuitpattern, a semiconductor device mounted on the interposer and includinga circuit board including an insulating layer, a first circuit patternformed on a bottom surface of the insulating layer and a second circuitpattern formed on a top surface of the insulating layer, a semiconductordie mounted on a bottom surface of the circuit board and having a metallayer formed on its bottom surface, an encapsulant encapsulating thesemiconductor die from a lower portion of the circuit board and havingthrough vias exposing the first circuit pattern to the outside, andconductive structures (e.g., conductive bumps or balls, pillars, wires,etc.) formed in the through vias and electrically connected to the firstcircuit pattern, and a heat radiating member between the interposer andthe semiconductor die, wherein the heat radiating member is electricallyconnected to the metal layer and the conductive pad.

The heat radiating member may, for example, be formed of a solder paste(e.g., at least initially, prior to a reflow process if performed).

According to still another aspect of the present disclosure, there isprovided a fabricating method of a semiconductor package, includingpreparing a semiconductor device including a circuit board including aninsulating layer, a first circuit pattern formed on a top surface of theinsulating layer and a second circuit pattern formed on a bottom surfaceof the insulating layer, a semiconductor die mounted on a top surface ofthe circuit board and having a metal layer formed thereon, anencapsulant encapsulating the semiconductor die from an upper portion ofthe circuit board and having through vias exposing the first circuitpattern to the outside of the encapsulant, and conductive structures(e.g., conductive bumps or balls, pillars, wires, etc.) formed in thethrough vias and electrically connected to the first circuit pattern,forming a heat radiating member on the semiconductor die, for example bycoating, and positioning an interposer on the heat radiating member andperforming a reflow process on the interposer, the interposer includingan insulator, a circuit pattern and conductive pads formed on a bottomsurface of the insulator and conductive structures (e.g., conductivebumps or balls, solder balls, pillars, wires, etc.) formed on thecircuit pattern.

In the forming of the heat radiating member, the heat radiating membermay, for example, be coated on the metal layer of the semiconductor die.

In the performing of the reflow process, the conductive structures inthe through vias may, for example, be welded to the conductivestructures attached to the interposer, and the heat radiating member maybe electrically connected to the metal layer and the conductive pad.

The heat radiating member may, for example, be formed of a solder paste(e.g., at least initially, prior to a reflow process if performed).

After the performing of the reflow process, the fabricating method may,for example, further include forming an interlayer member between thesemiconductor device and the interposer by, for example,injection-molding.

According to still another aspect of the present disclosure, there isprovided a fabricating method of a semiconductor package, includingpreparing an interposer including an insulator, a circuit pattern and aconductive pad formed on a top surface of the insulator and conductivestructures (e.g., conductive bumps or balls, solder balls, pillars,wires, etc.) formed on the circuit pattern, forming a heat radiatingmember on the interposer, for example by coating, and positioning asemiconductor device and performing a reflow process on thesemiconductor device, the semiconductor device including a circuit boardincluding an insulating layer formed on the heat radiating member, afirst circuit pattern formed on a bottom surface of the insulating layerand a second circuit pattern formed on a top surface of the insulatinglayer, a semiconductor die mounted on a bottom surface of the circuitboard and having a metal layer formed on its bottom surface, anencapsulant encapsulating the semiconductor die from a bottom portion ofthe circuit board and having through vias exposing the first circuitpattern to the outside, and conductive structures (e.g., conductivebumps or balls, pillars, wires, etc.) formed in the through vias andelectrically connected to the first circuit pattern.

In the forming of the heat radiating member, the heat radiating membermay, for example, be coated on conductive pads of the interposer.

In the performing of the reflow process, the conductive structures inthe through vias may be welded to the conductive structures attached tothe interposer, and the heat radiating member may be electricallyconnected to the metal layer and the conductive pad.

The heat radiating member may, for example, be formed of a solder paste(e.g., at least initially, prior to a reflow process if performed).

As described above, in the semiconductor package according to an exampleof the present disclosure, since the interlayer member made of an epoxyflux is formed between the semiconductor device and the interposer,bondability between the semiconductor device and the interposer isincreased, thereby improving the reliability and reducing warpage.

In addition, in a semiconductor package according to various aspects ofthe present disclosure, since the heat radiating member made of a solderpaste is formed between the semiconductor device and the interposer,heat generated from the semiconductor device can be efficiently radiatedto the outside through the interposer.

Example aspects of the present disclosure will now be presented withreference to accompanying drawings, such that those skilled in the artmay readily practice the various aspects.

Referring to FIG. 1, the semiconductor package 100 according to anexample of the present disclosure includes a semiconductor device 110,an interposer 160 and an interlayer member 170. Note that the examplesemiconductor package 100 may share any or all characteristics with anyone or more other semiconductor packages discussed herein.

The semiconductor device 110 includes a circuit board 120, asemiconductor die 130, an encapsulant 140 and conductive structures 150(e.g., conductive bumps or balls, pillars, wires, etc.). Thesemiconductor device 110 may, for example, be called a through mold via(TMV) semiconductor device.

The circuit board 120 includes an insulating layer 121 having planar topand bottom surfaces, a first circuit pattern 122 formed on a top surfaceof the insulating layer 121, a second circuit pattern 123 formed on abottom surface of the insulating layer 121, and a passivation layer 124formed along outer peripheral edges of the first and second circuitpatterns 122 and 123 to a predetermined thickness. The circuit board 120may, for example, be a printed circuit board (PCB) having oppositesurfaces. Here, conductive structures (e.g., conductive bumps or balls,solder balls, pillars, wires, etc.) (not shown) are welded plated orotherwise attached to the second circuit pattern 123 to then beelectrically connected to an external circuit.

The semiconductor die 130 is mounted on the circuit board 120. Thesemiconductor die 130 may, for example, be generally made of a siliconmaterial and have a plurality of semiconductor devices formed therein.In addition, a plurality of conductive structures 131 (e.g., conductivebumps or balls, solder balls, pillars, wires, etc.) may be formed underthe semiconductor die 130. The semiconductor die 130 is electricallyconnected to the circuit board 120 through the conductive structures131. The conductive structures 131 may be electrically connected to thefirst circuit pattern 122 of the circuit board 120.

The encapsulant 140 encapsulates the semiconductor die 130 from an upperportion of the circuit board 120. The encapsulant 140 may, for example,expose a top portion of the semiconductor die 130 to the outside of theencapsulant 140. In addition, through vias 141 may be formed in theencapsulant 140. The through vias 141 may, for example, be formed overthe first circuit pattern 122 of the circuit board 120 and expose thefirst circuit pattern 122 to the outside of the encapsulant 140.

The conductive structures 150 (e.g., conductive bumps or balls, pillars,wires, etc.) may be formed on the first circuit pattern 122 exposed tothe outside of the encapsulant 140 by the through vias 141. Theconductive structures 150 may, for example, be electrically connected tothe semiconductor die 130 through the first circuit pattern 122. Theconductive structures 150 may, for example, include tin/lead, leadlesstin, equivalents thereof, etc., but aspects of the present disclosureare not limited thereto.

The interposer 160 is mounted on the semiconductor device 110. Theinterposer 160 includes an insulator 161 having planar top and bottomsurfaces, a circuit pattern 162 formed on a bottom surface of theinsulator 161 and conductive structures 163 (e.g., conductive bumps orballs, pillars, wires, etc.) formed on the circuit pattern 162. Inaddition, the interposer 160 may also include a circuit pattern formedon a top surface of the insulator 161 so as to stack semiconductordevices, such as for example memory chips or logic chips, thereon. Thesolder balls 163 are electrically connected to the conductive bumps 150of the semiconductor device 110. For example, when the interposer 160 ismounted on the semiconductor device 110, the solder balls 163 are weldedto the conductive bumps 150 to electrically connect the interposer 160and the semiconductor device 110 to each other. The interposer 160 may,for example, be a silicon substrate, a printed circuit board (PCB), etc.

The interlayer member 170 may be formed between the semiconductor device110 and the interposer 160. For example, the interlayer member 170 maybe interposed between a top surface of the semiconductor die 130 mountedon the circuit board 120 and a bottom surface of the interposer 160. Inaddition, the interlayer member 170 may be formed to cover lateralsurfaces of the conductive bumps 150 of the semiconductor device 110 andthe solder balls 163 of the interposer 160.

The interlayer member 170 may, for example, be formed of an epoxy flux.The epoxy flux may, for example, be applied to surrounding areas of theconductive bumps 150 and the solder balls 163, thereby improvingadhesion between the conductive bumps 150 and the solder balls 163 andallowing the heat generated from the semiconductor die 130 to betransferred to the interposer 160 to then be transferred (e.g.,radiated, conducted, convected, etc.) to the outside. Accordingly,cooling efficiency of the semiconductor package 100 according to variousaspects of the present disclosure may be improved. For example, theinterlayer member 170 may tightly couple the semiconductor device 110 tothe interposer 160. In addition, the interlayer member 170 may reducewarpage occurring between the semiconductor device 110 and theinterposer 160.

In addition, the interlayer member 170 may, for example, be formed byinjecting an epoxy resin or an epoxy molding compound (EMC) into aregion between the semiconductor device 110 and the interposer 160.Further for example, the interlayer member 170 may also be formed of ananisotropically conductive paste (ACP). The anisotropically conductivepaste (ACP) includes a binder and a conductive filler mixed therein andis used to mechanically and electrically connect upper and lowerelectrodes coupled to each other, for example by thermal compression. Inaddition, since the binder functions as an insulator, an insulatingproperty is maintained between conductive fillers existing in adjacentcircuits.

FIG. 2 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure.

Referring to FIG. 2, the semiconductor package 200 according to anotherexample of the present disclosure includes a semiconductor device 110,an interposer 160 and an interlayer member 270. The semiconductorpackage 200 shown in FIG. 2 is substantially the same as thesemiconductor package 100 shown in FIG. 1, and the following descriptionwill generally focus on differences therebetween. Note that the examplesemiconductor package 200 may share any or all characteristics with anyone or more other semiconductor packages discussed herein.

The interlayer member 270 is formed between the semiconductor device 110and the interposer 160. The interlayer member 270 may, for example,include a first interlayer member part 271 covering lateral surfaces ofthe conductive structures 150 and the conductive structures 163 and asecond interlayer member part 272 formed at an outer peripheral edge ofthe first interlayer member part 271. For example, the second interlayermember part 272 may encapsulate the first interlayer member part 271.Also for example, the second interlayer member part 272 may be formedoutside of a region generally defined by a plurality of first interlayermember parts 271, inside of a region generally defined by a plurality offirst interlayer member parts 271, and/or between first interlayermember parts 271. Though shown in FIG. 2 as contacting the firstinterlayer member part 271, the second interlayer member part 272 may beseparated from the first interlayer member part 271 by a gap (e.g., anair gap or gap filled with another material).

The first interlayer member part 271 is formed in the vicinity of areaswhere the conductive bumps 150 of the semiconductor device 110 arewelded or otherwise attached to the conductive structures 163 attachedto the interposer 160. Here, the first interlayer member part 271 may beformed to fill the through vias 141 of the semiconductor device 110(e.g., in regions not already occupied by conductive structure). Inaddition, the first interlayer member part 271 may, for example, beformed of an epoxy flux and cover the surrounding areas of theconductive structures 150 and the conductive structures 163. Therefore,the first interlayer member part 271 may improve adhesion between theconductive structures 150 and the conductive structures 163.

The second interlayer member part 272 may, for example, be formed alongthe outer peripheral edge of the first interlayer member part 271. Forexample, the second interlayer member part 272 may be formed between thesemiconductor device 110 and the interposer 160, where the conductivestructures 150 are not welded to the conductive structures 163. Forexample, the second interlayer member part 272 is formed between thesemiconductor die 130 and the interposer 160 and between the encapsulant140 and the interposer 160. The second interlayer member part 272 may,for example, be formed of a general adhesive, such as an epoxy resin orEMC, or of other materials. The second interlayer member part 272 may,for example, transfer the heat generated from the semiconductor die 130to the interposer 160 to then be transferred (e.g., radiated, conducted,convected, etc.) to the outside. In addition, the second interlayermember part 272 may improve bondability between the semiconductor device110 and the interposer 160.

FIGS. 3A to 3D are cross-sectional views illustrating an example methodof fabricating a semiconductor package, in accordance with variousaspects of the present disclosure.

The method of fabricating (or manufacturing) a semiconductor packageaccording to an example of the present disclosure includes preparing asemiconductor device, forming an interlayer member and performing areflow process. Hereinafter, the method of fabricating a semiconductorpackage according to an example of the present disclosure will bedescribed in detail with reference to FIGS. 3A to 3D. Note that theexample method may share any or all characteristics with any one or moreother methods discussed herein.

In the preparing of the semiconductor device, as illustrated in FIG. 3A,the semiconductor device 110 is prepared, the semiconductor device 110including a circuit board 120 having a first circuit pattern 122 formedon its top surface, a semiconductor die 130 mounted on a top surface ofthe circuit board 120, an encapsulant 140 encapsulating thesemiconductor die 130 from an upper portion of the circuit board 120,and conductive structures 150 (e.g., conductive bumps or balls, pillars,wires, etc.) formed on the first circuit pattern 122 and penetrating(e.g., extending partly through, extending completely through, orextending completely through and beyond) the encapsulant 140. Here, thecircuit board 120 may, for example, include an insulating layer 121having planar top and bottom surfaces, the first circuit pattern 122formed on the top surface of the insulating layer 121, a second circuitpattern 123 formed on the bottom surface of the insulating layer 121 anda passivation layer 124 formed along outer peripheral edges of the firstand second circuit patterns 122 and 123 to a predetermined thickness.

In the forming of the interlayer member, as illustrated in FIG. 3B, theinterlayer member 170 is formed (e.g., coated, etc.) on thesemiconductor device 110. Here, the interlayer member 170 may be formedto entirely cover the top portion of the semiconductor device 110. Theinterlayer member 170 may, for example, be formed of an epoxy flux, ananisotropically conductive paste (ACP), etc. The epoxy flux may, forexample, cover surrounding areas of the conductive structures 150 andthe conductive structures 163 of the interposer 160, which will later bedescribed, thereby improving adhesion between the conductive structures150 and the conductive structures 163 and allowing the heat generatedfrom the semiconductor die 130 to be transferred to the interposer 160to then be transferred (e.g., radiated, conducted, convected, etc.) tothe outside. In addition, the anisotropically conductive paste (ACP) mayinclude a binder and a conductive filler mixed therein and is used tomechanically and electrically connect upper and lower electrodescombined with each other by thermal compression. In addition, since thebinder functions as an insulator, an insulating property is maintainedbetween conductive material existing in adjacent circuits.

In the performing of the reflow process, as illustrated in FIG. 3C, theinterposer 160 is positioned on the interlayer member 170 and a reflowprocess is performed thereon, the interposer 160 including an insulator161, a circuit pattern 162 formed on a bottom surface of the insulator161 and conductive structures 163 formed on the circuit pattern 162.Accordingly, as illustrated in FIG. 3D, the conductive structures 150 ofthe semiconductor device 110 are welded (or otherwise attached) to theconductive structures 163 of the interposer 160. In addition, theinterlayer member 170 is cured between the semiconductor device 110 andthe interposer 160, thereby improving bondability between thesemiconductor device 110 and the interposer 160.

FIGS. 4A to 4G are cross-sectional views illustrating another examplemethod of fabricating a semiconductor package, in accordance withvarious aspects of the present disclosure.

The method of fabricating (or manufacturing) a semiconductor packageaccording to another example of the present disclosure includespreparing a semiconductor device, forming a first interlayer memberpart, performing a reflow process and forming a second interlayer memberpart. Hereinafter, the method of fabricating a semiconductor packageaccording to another example of the present disclosure will be describedin detail with reference to FIGS. 4A to 4G. Note that the example methodmay share any or all characteristics with any one or more other methodsdiscussed herein.

In the preparing of the semiconductor device, as illustrated in FIG. 4A,the semiconductor device 110 is prepared, the semiconductor device 110including a circuit board 120 having a first circuit pattern 122 formedon its top surface, a semiconductor die 130 mounted on a top surface ofthe circuit board 120, an encapsulant 140 encapsulating thesemiconductor die 130 from an upper portion of the circuit board 120,and conductive structures 150 (e.g., conductive bumps or balls, pillars,wires, etc.) formed on the first circuit pattern 122 and penetrating(e.g., extending partially through, extending completely through,extending completely through and past, etc.) the encapsulant 140.

In the forming of the first interlayer member part, as illustrated inFIG. 4B, the first interlayer member part 271 is formed on thesemiconductor device 110. Here, the first interlayer member part 271 isformed to cover top portions of through vias 141 having conductivestructures 150 formed in the semiconductor device 110. The firstinterlayer member part 271 may be formed of an epoxy flux.

In the performing of the reflow process, as illustrated in FIG. 4C, ainterposer 160 is positioned on the first interlayer member part 271 anda reflow process is performed thereon, the interposer 160 including aninsulator 161, a circuit pattern 162 formed on a bottom surface of theinsulator 161 and conductive structures (e.g., conductive bumps orballs, solder balls, pillars, wires, etc.) formed on the circuit pattern162. Accordingly, as illustrated in FIG. 4D, the conductive structures150 of (or attached to) the semiconductor device 110 are welded (orotherwise connected) to the conductive structures 163 of (or attachedto) the interposer 160. In addition, the first interlayer member part271 is cured while covering lateral surfaces of the conductive bumps 150and the solder balls 163, thereby improving bondability between thesemiconductor device 110 and the interposer 160.

In the forming of the second interlayer member part, as illustrated inFIG. 4E, a second interlayer member part 272 is injected into a portionbetween the semiconductor device 110 and the interposer 160, followed bycuring. The second interlayer member part 272 may, for example, beformed of a general adhesive, such as an epoxy resin. Accordingly, thesemiconductor package 200 according to the present disclosure can becompleted.

In addition, for example, the second interlayer member part 272 may bepre-formed on the semiconductor device 110 in the forming of the firstinterlayer member part, as illustrated in FIG. 4F. For example, afterthe first interlayer member part 271 and the second interlayer memberpart 272 are both formed on the semiconductor device 110, a reflowprocess is then performed, and the semiconductor package 200 accordingto the present disclosure may then be completed, as illustrated in FIG.4E.

Further, for example, the first interlayer member part 271 may beperformed by dipping, as illustrated in FIG. 4G. For example, after thefirst interlayer member part 271 is pre-formed on the conductivestructures 163 of the interposer 160 by dipping, the interposer 160 ismounted on the semiconductor device 110, followed by performing a reflowprocess, thereby allowing the first interlayer member part 271 to coverlateral surfaces of the conductive structures 150 and the conductivestructures 163, as illustrated in FIG. 4D.

FIG. 5 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure.

Referring to FIG. 5, the semiconductor package 300 according to stillanother example of the present disclosure includes a circuit board 310,a semiconductor die 320, an interposer 330 and an interlayer member 340.Note that the example semiconductor package 300 may share any or allcharacteristics with any one or more other semiconductor packagesdiscussed herein

The circuit board 310 includes an insulating layer 311 having planar topand bottom surfaces, a first circuit pattern 312 formed on a top surfaceof the insulating layer 311, a second circuit pattern 313 formed on abottom surface of the insulating layer 311, and a passivation layer 314formed along outer peripheral edges of the first and second circuitpatterns 312 and 313 to a predetermined thickness. The circuit board 310may, for example, be a printed circuit board (PCB) (e.g., a package ordevice substrate) having opposite surfaces. Here, conductive structures(e.g., conductive bumps or balls, pillars, wires, etc.) (not shown) maybe welded (or otherwise attached) to the second circuit pattern 313 tothen be electrically connected to an external circuit.

The semiconductor die 320 is mounted on the circuit board 310. Thesemiconductor die 320 may, for example, be generally made of a siliconmaterial and has a plurality of semiconductor devices formed therein. Inaddition, a plurality of conductive structures 321 (e.g., conductivebumps or balls, solder balls, pillars, wires, etc.) are formed under thesemiconductor die 320. The semiconductor die 320 is electricallyconnected to the circuit board 310 through the conductive structures321. The conductive structures 321 may, for example, be electricallyconnected to the first circuit pattern 312 of the circuit board 310. Inaddition, an underfill 322 may, for example, be formed between thesemiconductor die 320 and the circuit board 310. The underfill 322 isinjected into a space between the semiconductor die 320 and the circuitboard 310 to then encapsulate the conductive structures 321.

The interposer 330 is mounted on the circuit board 310 and thesemiconductor die 320. The interposer 330 includes an insulator 331having planar top and bottom surfaces, a circuit pattern 332 formed on abottom surface of the insulator 331 and a conductive structure 333(e.g., conductive filler, pillar, wire, conductive bump or ball, etc.)formed on the circuit pattern 332. In addition, the interposer 330 mayalso include a circuit pattern formed on a top surface of the insulator331 so as to stack semiconductor devices, such as memory chips or logicchips, thereon. The conductive structure 333 is electrically connectedto the first circuit pattern 312 of the circuit board 310. A solder cap333 a may be formed in the conductive structure 333 to then be easilycoupled to the first circuit pattern 312. The conductive structure 333may, for example, be formed to have a height equal to or greater thanthat of the semiconductor die 320. The conductive structure 333 may, forexample, electrically connect the interposer 330 and the semiconductordie 320 to each other through the first circuit pattern 312. Inaddition, the conductive structure 333 may comprise a copper filler(e.g., a copper pillar), but aspects of the present disclosure are notlimited thereto. In addition, the interposer 330 may comprise a siliconsubstrate, a laminate substrate, a printed circuit board (PCB), etc.

The interlayer member 340 is formed between the circuit board 310 andthe interposer 330. For example, the interlayer member 340 is formedbetween the circuit board 310 and the interposer 330 to cover lateralsurfaces of the semiconductor die 320 and the conductive structure 333positioned between the circuit board 310 and the interposer 330.

The interlayer member 340 may, for example, be formed of an epoxy flux.The epoxy flux may, for example, be applied to surrounding areas of theconductive structure 333, thereby improving adhesion between the soldercap 333 a and the first circuit pattern 312 and allowing the heatgenerated from the semiconductor die 320 to be transferred to theinterposer 330 to then be transferred (e.g., radiated, conducted,convected, etc.) to the outside. Accordingly, cooling efficiency of thesemiconductor package 300 according to the present disclosure may beimproved. For example, the interlayer member 340 may tightly couple thecircuit board 310 to the interposer 330. In addition, the interlayermember 340 may reduce warpage occurring between the circuit board 310and the interposer 330.

In addition, the interlayer member 340 may be formed by injecting anepoxy resin or an epoxy molding compound (EMC) into a space between thecircuit board 310 and the interposer 330. Further, the interlayer member340 may also be formed of an anisotropically conductive paste (ACP). Theanisotropically conductive paste (ACP) includes a binder and aconductive filler mixed therein and is used to mechanically andelectrically connect upper and lower electrodes combined with eachother, for example by thermal compression. In addition, since the binderfunctions as an insulator, an insulating property is maintained betweenconductive materials (e.g., conductive fillers, conductive structures,etc.) existing in adjacent circuits.

FIG. 6 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure.

Referring to FIG. 6, the semiconductor package 400 according to stillanother example of the present disclosure includes a circuit board 310,a semiconductor die 320, an interposer 330 and an interlayer member 440.The semiconductor package 400 shown in FIG. 6 is substantially the sameas the semiconductor package 300 shown in FIG. 5, and the followingdescription the following description will generally focus ondifferences therebetween. Note that the example semiconductor package400 may share any or all characteristics with any one or more othersemiconductor packages discussed herein.

The interlayer member 440 is formed between the circuit board 310 andthe interposer 330. For example, the interlayer member 440 includes afirst interlayer member part 441 covering lateral surfaces of theconductive structure 333 (e.g., conductive filler, pillar, wire,conductive bump or ball, etc.) and a second interlayer member part 442formed at least along an outer peripheral edge of the first interlayermember part 441.

The first interlayer member part 441 is formed to cover the lateralsurfaces of the conductive structure 333. In addition, the firstinterlayer member part 441 is formed in vicinity of the first circuitpattern 312 of the circuit board 310 electrically connected to theconductive structure 333 and the circuit pattern 332 of the interposer330. In addition, the first interlayer member part 441 may be formed ofan epoxy flux and may be formed to cover a solder cap 333 a of theconductive structure 333 and the first circuit pattern 312 of thecircuit board 310. Therefore, the first interlayer member part 441 mayimprove adhesion between the conductive structure 333 and the firstcircuit pattern 312.

The second interlayer member part 442 is formed along the outerperipheral edge of the first interlayer member part 441. For example,the second interlayer member part 442 may be formed between the circuitboard 310 and the interposer 330, where the conductive structure 333 isnot formed. For example, the second interlayer member part 442 may beformed between the circuit board 310 and the interposer 330 and/orbetween the semiconductor die 320 and the interposer 330. The secondinterlayer member part 442 may transfer the heat generated from thesemiconductor die 320 to the interposer 330 to then be transferred(e.g., radiated, conducted, convected, etc.) to the outside. Inaddition, the second interlayer member part 442 may, for example, beformed of a general adhesive, such as an epoxy resin, a molded underfill(MUF), etc.

FIG. 7 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure.

Referring to FIG. 7, the semiconductor package 500 according to stillanother example of the present disclosure includes a circuit board 310,a semiconductor die 320, an interposer 330 and an interlayer member 540.The semiconductor package 500 shown in FIG. 7 is substantially the sameas the semiconductor package 400 shown in FIG. 6, and the followingdescription the following description will generally focus ondifferences therebetween. Note that the example semiconductor package500 may share any or all characteristics with any one or more othersemiconductor packages discussed herein.

The interlayer member 540 is formed between the circuit board 310 andthe interposer 330. For example, the interlayer member 540 includes afirst interlayer member part 541 covering lateral surfaces of theconductive structure 333 and a second interlayer member part 542 formedbetween the semiconductor die 320 and the interposer 330. For example,in the semiconductor package 500 shown in FIG. 7, the second interlayermember part 542 is formed only between the semiconductor die 320 and theinterposer 330. In an example implementation, there may be voids or gapsbetween the first interlayer member part 541 and the second interlayermember part 542, which may then be left void or may be wholly orpartially filled with other material.

The second interlayer member part 542, formed between the semiconductordie 320 and the interposer 330, may transfer the heat generated from thesemiconductor die 320 to the interposer 330 to then transfer (e.g.,radiate, conduct, convect, etc.) the heat to the outside. The secondinterlayer member part 542 may, for example, be formed of a thermallyconductive adhesive.

FIGS. 8A to 8D are cross-sectional views illustrating still anotherexample method of fabricating a semiconductor package, in accordancewith various aspects of the present disclosure.

The method of fabricating (or manufacturing) a semiconductor packageaccording to still another example of the present disclosure includesattaching a semiconductor die, forming an interlayer member andperforming a reflow process. Hereinafter, the method of fabricating asemiconductor package according to still another example of the presentdisclosure will be described in detail with reference to FIGS. 8A to 8D.Note that the example method may share any or all characteristics withany one or more other methods discussed herein.

In the attaching of the semiconductor die, as illustrated in FIG. 8A,the semiconductor die 320 is attached on a circuit board 310. Here, thecircuit board 310 includes an insulating layer 311, a first circuitpattern 312 formed on a top surface of the insulating layer 311, asecond circuit pattern 313 formed on a bottom surface of the insulatinglayer 311, and a passivation layer 314 formed along outer peripheraledges of the first and second circuit patterns 312 and 313 to apredetermined thickness. In addition, the semiconductor die 320 may, forexample, be generally made of a silicon material and has a plurality ofsemiconductor devices formed therein. In addition, a plurality ofconductive structures 321 (e.g., conductive bumps or balls, solderballs, pillars, wires, etc.) are formed under the semiconductor die 320and an underfill 322 is formed between the semiconductor die 320 and thecircuit board 310. In the attaching of the semiconductor die, theconductive structures 321 are electrically connected to the firstcircuit pattern 312.

In the forming of the interlayer member, as illustrated in FIG. 8B, theinterlayer member 340 is formed (e.g., coated, etc.) on the circuitboard 310 and the semiconductor die 320.

The interlayer member 340 may, for example, be formed of an epoxy flux,an anisotropically conductive paste (ACP), etc. Here, the epoxy fluxmay, for example, be applied to surrounding areas of a conductivestructure 333 (e.g., conductive filler, pillar, wire, conductive bump orball, etc.) of an interposer 330, which will later be described, therebyimproving adhesion between the conductive structure 333 and the firstcircuit pattern 312 and allowing the heat generated from thesemiconductor die 320 to be transferred to the interposer 330 to then betransferred (e.g., radiated, conducted, convected, etc.) to the outside.In addition, the anisotropically conductive paste (ACP) may, forexample, include a binder and a conductive filler mixed therein and isused to mechanically and electrically connect upper and lower electrodescombined with each other by thermal compression. In addition, since thebinder functions as an insulator, an insulating property is maintainedbetween conductive structures (e.g., fillers, etc.) existing in adjacentcircuits.

In the performing of the reflow process, as illustrated in FIG. 8C, theinterposer 330 is positioned on the interlayer member 340 and a reflowprocess is performed thereon, the interposer 340 including an insulator331, a circuit pattern 332 formed on a bottom surface of the insulator331 and the conductive structure 333 formed on the circuit pattern 332.As illustrated in FIG. 8D, a solder cap 333 a of the conductivestructure 333 is welded (or otherwise attached) to the first circuitpattern 312 of the circuit board 310. In addition, the interlayer member340 is cured between the circuit board 310 and the interposer 330,thereby improving bondability between each of the circuit board 310, thesemiconductor die 320 and the interposer 330.

FIGS. 9A to 9E are cross-sectional views illustrating an additionalexample method of fabricating a semiconductor package, in accordancewith various aspects of the present disclosure, and FIGS. 10A and 10Bare cross-sectional views illustrating a further example method offabricating a semiconductor package, in accordance with various aspectsof the present disclosure.

The method of fabricating a semiconductor package according to stillanother example of the present disclosure includes attaching asemiconductor die, forming a first interlayer member part, performing areflow process and forming a second interlayer member part. Hereinafter,the fabricating method of a semiconductor package according to stillanother example of the present disclosure will be described in detailwith reference to FIGS. 9A to 9E. Note that the example methods mayshare any or all characteristics with any one or more other methodsdiscussed herein.

In the attaching of the semiconductor die, as illustrated in FIG. 9A,the semiconductor die 320 is attached on a circuit board 310. Here, thecircuit board 310 includes an insulating layer 311, a first circuitpattern 312 formed on a top surface of the insulating layer 311, asecond circuit pattern 313 formed on a bottom surface of the insulatinglayer 311, and a passivation layer 314 formed along outer peripheraledges of the first and second circuit patterns 312 and 313 to apredetermined thickness. In addition, the semiconductor die 320 may, forexample, be generally made of a silicon material and has a plurality ofsemiconductor devices formed therein. In addition, a plurality of solderstructures 321 (e.g., conductive bumps or balls, solder balls, pillars,wires, etc.) are formed under the semiconductor die 320 and an underfill322 is formed between the semiconductor die 320 and the circuit board310. In the attaching of the semiconductor die, the conductivestructures 321 are electrically connected to the first circuit pattern312.

In the forming of the first interlayer member part, as illustrated inFIG. 9B, the first interlayer member part 441 is formed on the circuitboard 310. Here, the first interlayer member part 441 is formed (e.g.,coated, etc.) to cover a top portion of the first circuit pattern 312formed on the circuit board 310. The first interlayer member part 441may, for example, be formed of an epoxy flux.

In the performing of the reflow process, as illustrated in FIG. 9C, theinterposer 330 is positioned on the first interlayer member part 441 anda reflow process is performed thereon, the first interlayer member part441 including an insulator 331, a circuit pattern 332 formed on a bottomsurface of the insulator 331 and the conductive structure 333 (e.g.,conductive filler, pillar, wire, conductive bump or ball, etc.) formedon the circuit pattern 332. As illustrated in FIG. 9D, a solder cap 333a of the conductive structure 333 is welded to the first circuit pattern312. In addition, the first interlayer member part 441 is cured whilecovering lateral surfaces of the conductive structure 333, and thecircuit pattern 332 of the interposer 330 is electrically connected tothe conductive structure 333 and the first circuit pattern 312 of thecircuit board 310, for example improving bondability between the circuitboard 310 and the interposer 330.

In the forming of the second interlayer member part, as illustrated inFIG. 9E, the second interlayer member part 442 is injected into a spacebetween the circuit board 310 and the interposer 330, followed bycuring. The second interlayer member part 442 may, for example, beformed of a general adhesive, such as an epoxy resin, molded underfill(MUF), etc. Accordingly, the example semiconductor package 400 accordingto the present example can be produced.

In addition, the second interlayer member part 542 may be pre-formed onthe semiconductor die 320 in the forming of the first interlayer memberpart, as illustrated in FIG. 10A. For example, after the firstinterlayer member part 541 is formed on the first circuit pattern 312 ofthe circuit board 310 and the second interlayer member part 542 isformed on the semiconductor die 320, a reflow process may then beperformed, and the semiconductor package 500 according to the presentexample may then be produced, as illustrated in FIG. 10B.

FIG. 11 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure.

Referring to FIG. 11, the semiconductor package 600 according to stillanother example of the present invention includes a semiconductor device610, an interposer 660 and a heat radiating member 670. Note that theexample semiconductor package 600 may share any or all characteristicswith any one or more other semiconductor packages discussed herein.

The semiconductor device 610 includes a circuit board 620, asemiconductor die 630, an encapsulant 640 and conductive structures 650(e.g., conductive bumps or balls, pillars, wires, etc.).

The circuit board 620 includes an insulating layer 621 having planar topand bottom surfaces, a first circuit pattern 622 formed on a top surfaceof the insulating layer 621, a second circuit pattern 623 formed on abottom surface of the insulating layer 621, and a passivation layer 624formed along outer peripheral edges of the first and second circuitpatterns 622 and 623 to a predetermined thickness. The circuit board 620may be a printed circuit board (PCB) (e.g., a package substrate, etc.)having opposite surfaces. Here, conductive structures (e.g., conductivebumps or balls, solder balls, pillars, wires, etc.) (not shown) may bewelded (or otherwise attached) to the second circuit pattern 623 to thenbe electrically connected to an external circuit.

The semiconductor die 630 is mounted on the circuit board 620. Thesemiconductor die 630 may, for example, be generally made of a siliconmaterial and has a plurality of semiconductor devices formed therein. Inaddition, a plurality of conductive structures 631 (e.g., conductivebumps or balls, solder balls, pillars, wires, etc.) are formed under thesemiconductor die 630. The semiconductor die 630 is electricallyconnected to the circuit board 620 through the conductive structures631. The conductive structures 631 may, for example, be electricallyconnected to the first circuit pattern 622 of the circuit board 620. Inaddition, a metal layer 632 may, for example, be formed on thesemiconductor die 630. The metal layer 632 may be formed by coating ametal on the semiconductor die 630. For example, the metal layer 632 maybe made of a conductive material, such as copper (Cu), gold (Au) orsilver (Ag), but aspects of the present disclosure are not limitedthereto.

The encapsulant 640 encapsulates the semiconductor die 630 from an upperportion of the circuit board 620. The encapsulant 640 may, for example,expose the metal layer 632 formed on the semiconductor die 630 to theoutside of the encapsulant 640. In addition, through vias 641 are formedin the encapsulant 640. The through vias 641 may, for example, be formedover the first circuit pattern 622 of the circuit board 620 and exposethe first circuit pattern 622 to the outside of the encapsulant 640.

The conductive structures 650 (e.g., conductive bumps or balls, pillars,wires, etc.) are formed on the first circuit pattern 622 and exposed tothe outside of the encapsulant 640 by the through vias 641. Theconductive structures 650 may, for example, be electrically connected tothe semiconductor die 630 through the first circuit pattern 622. Theconductive structures 650 may, for example, include tin/lead, leadlesstin, equivalents thereof, etc., but aspects of the present disclosureare not limited thereto.

The interposer 660 is mounted on the semiconductor device 610. Theinterposer 560 includes an insulator 661 having planar top and bottomsurfaces, a circuit pattern 662 formed on a bottom surface of theinsulator 661 and conductive structures 663 (e.g., conductive bumps orballs, solder balls, pillars, wires, etc.) formed on the circuit pattern662. In addition, the interposer 660 may also include a circuit patternformed on a top surface of the insulator 661 so as to stacksemiconductor devices, such as memory chips or logic chips, thereon. Inaddition, the interposer 660 may further include a conductive pad 664formed on its bottom surface. Here, the conductive pad 664 may, forexample, be formed at the center of the interposer 660 and the circuitpattern 662 is formed at an outer peripheral edge of the conductive pad664. The circuit pattern 662 and the conductive pad 664 may, forexample, be formed of the same material. In addition, the conductive pad664 may be formed to correspond to the metal layer 632 of thesemiconductor die 630. Further, the interposer 660 may also include acircuit pattern formed on a top surface of the insulator 661 so as tostack semiconductor devices, such as memory chips or logic chips,thereon.

The conductive structures 663 are electrically connected to theconductive structures 650 of the semiconductor device 610. For example,when the interposer 660 is mounted on the semiconductor device 610, theconductive structures 663 are welded (or otherwise attached) to theconductive structures 650 to electrically connect the interposer 660 andthe semiconductor device 610 to each other. The interposer 660 may, forexample, comprise a silicon substrate, a printed circuit board (PCB),etc.

The heat radiating member 670 is formed between the semiconductor device610 and the interposer 660. For example, the heat radiating member 670may be formed between the semiconductor device 610 and the conductivepad 664 of the interposer 660. In addition, the heat radiating member670 may, for example, be formed of a solder paste (e.g., at leastinitially, prior to reflow if performed) and may be electricallyconnected (or at least heat-conductively connected) to the metal layer632 and the conductive pad 664. The heat radiating member 670 maytransfer the heat generated from the semiconductor die 630 to theinterposer 660 to then be transferred (e.g., radiated, conducted,convected, etc.) to the outside. Accordingly, cooling efficiency of thesemiconductor package 600 according to the present disclosure may beimproved.

FIG. 12 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure.

Referring to FIG. 12, the semiconductor package 700 according to stillanother example of the present disclosure includes a semiconductordevice 610, an interposer 660, a heat radiating member 670 and aninterlayer member 780. For example, the example semiconductor package700 shown in FIG. 12 further includes the interlayer member 780,compared to the semiconductor package 600 shown in FIG. 11. Thus, thefollowing description will focus on the interlayer member 780, which isa different feature between the semiconductor packages 600 and 700 shownin FIGS. 11 and 12. Note that the example semiconductor package 700 mayshare any or all characteristics with any one or more othersemiconductor packages discussed herein.

The interlayer member 780 is formed between the semiconductor device 610and the interposer 660. For example, the interlayer member 780 is formedto fill a space between the semiconductor device 610 and the interposer660, where the heat radiating member 670 is not formed and/or where theconductive structures 650 and 663 are not formed. For example, theinterlayer member 780 may be formed by injecting an underfill into aspace between the semiconductor device 610 and the interposer 660,followed by curing, thereby more tightly coupling the semiconductordevice 610 and the interposer 660 to each other. In addition, theinterlayer member 780 may be formed of an epoxy flux, an epoxy resin orother adhesives, but not limited thereto.

In addition, the interlayer member 780 may reduce warpage occurringbetween the semiconductor device 610 and the interposer 660. Asdescribed above, the interlayer member 780 may improve the reliabilityof the semiconductor package 700 according to the present disclosure.

FIG. 13 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure.

Referring to FIG. 13, the semiconductor package 800 according to stillanother example of the present disclosure includes an interposer 660, asemiconductor device 610 and a heat radiating member 670. Thesemiconductor package 800 shown in FIG. 13 is configured such that thesemiconductor package 600 shown in FIG. 11 is reversed. For example, inthe semiconductor package 800, the semiconductor device 610 is formed onthe interposer 660 and the heat radiating member 670 is formed betweenthe interposer 660 and the semiconductor device 610. Note that theexample semiconductor package 800 may share any or all characteristicswith any one or more other semiconductor packages discussed herein.

As described above, the semiconductor package 800 according to stillanother example of the present disclosure is slightly different from thesemiconductor package 600 shown in FIG. 11 in that the semiconductordevice 610 and the interposer 660 are just transposed, and a detaileddescription thereof will not be given.

FIGS. 14A to 14E are cross-sectional views illustrating a still furtherexample method of fabricating a semiconductor package, in accordancewith various aspects of the present disclosure.

The method of fabricating a semiconductor package according to stillanother example of the present disclosure includes preparing asemiconductor device, forming a heat radiating member, performing areflow process and forming an interlayer member. Hereinafter, the methodof fabricating a semiconductor package according to still anotherexample of the present disclosure will be described in detail withreference to FIGS. 14A to 14E. Note that the example method may shareany or all characteristics with any one or more other methods discussedherein.

In the preparing of the semiconductor device, as illustrated in FIG.14A, the semiconductor device 610 is prepared, the semiconductor device610 including a circuit board 620 having a first circuit pattern 622formed on its top surface, a semiconductor die 630 mounted on a topsurface of the circuit board 620 and having a metal layer 632 formedthereon, an encapsulant 640 encapsulating the semiconductor die 630 froman upper portion of the circuit board 620, and conductive bumps 650formed on the first circuit pattern 622 while penetrating theencapsulant 640. For example, the semiconductor device 610 (or anysemiconductor device discussed herein) may include a plurality ofsemiconductor devices provided in panel types.

In the forming of the heat radiating member, as illustrated in FIG. 14B,the heat radiating member 670 is formed (e.g., coated, etc.) on thesemiconductor die 630. For example, the heat radiating member 670 may beformed to cover the metal layer 632 formed on the semiconductor die 630.In addition, the heat radiating member 670 may be formed of a solderpaste and may be electrically connected to the metal layer 632 of thesemiconductor die 630 and a conductive pad 664 of an interposer 660,which will be described later.

In the performing of the reflow process, as illustrated in FIG. 14C, theinterposer 660 is positioned on the heat radiating member 670 and thereflow process is performed thereon, the interposer 660 including aninsulator 661, a circuit pattern 662 formed on a bottom surface of theinsulator 661, the conductive pad 664 and conductive structures 663(e.g., conductive bumps or balls, solder balls, pillars, wires, etc.)formed on the circuit pattern 662. Accordingly, as illustrated in FIG.14D, the conductive structures 650 (e.g., conductive bumps or balls,pillars, wires, etc.) of the semiconductor device 610 are welded (orotherwise attached) to the conductive structures 663 of the interposer660. In addition, the heat radiating member 670 may be cured between thesemiconductor device 610 and the interposer 660 may be electricallyconnected to the metal layer 632 and the conductive pad 664. Therefore,the heat radiating member 670 may transfer the heat generated from thesemiconductor die 630 to the interposer 660 to then be transferred(e.g., radiated, conducted, convected, etc.) to the outside. Accordingto the above-described fabricating method, the semiconductor package 700according to the present example can be produced.

Alternatively, the semiconductor package 700 may be fabricated byfurther forming the interlayer member 780 between the semiconductordevice 610 and the interposer 660, for example after the performing ofthe reflow process. For example, in forming of the interlayer member, asillustrated in FIG. 14E, the interlayer member 780 may be injected intoa space the semiconductor device 610 and the interposer 660, followed bycuring. The interlayer member 780 may, for example, be formed of anunderfill, an epoxy flux, an epoxy resin, other adhesives, etc. Theinterlayer member 780 may improve bondability between the semiconductordevice 610 and the interposer 660. In an example fabrication scenario,the semiconductor package 700 may be produced by sawing the panel-typesemiconductor device 610 after the forming of the interlayer member.

FIGS. 15A to 15D are cross-sectional views illustrating yet anotherexample method of fabricating a semiconductor package, in accordancewith various aspects of the present disclosure.

The method of fabricating a semiconductor package according to stillanother example of the present disclosure includes preparing aninterposer, forming a heat radiating member and performing a reflowprocess. Hereinafter, the method of fabricating a semiconductor packageaccording to still another example of the present disclosure will bedescribed in detail with reference to FIGS. 15A to 15D. Note that theexample method may share any or all characteristics with any one or moreother methods discussed herein.

In the preparing of the interposer, as illustrated in FIG. 15A, theinterposer 660 is prepared, the interposer 660 including an insulator661, a circuit pattern 662 formed on a top surface of the insulator 661,a conductive pad 664 and conductive structures 663 (e.g., conductivebumps or balls, solder balls, pillars, wires, etc.) formed on thecircuit pattern 662. For example, the interposer 660 may, for example,include a plurality of interposers provided in panel types.

In the forming of the heat radiating member, as illustrated in FIG. 15B,the heat radiating member 670 is formed (e.g., coated, etc.) on theinterposer 660. Here, the heat radiating member 670 is formed to coverthe conductive pad 664 formed on the interposer 660. In addition, theheat radiating member 670 may, for example, be formed of a solder pasteand be electrically connected to the conductive pad 664 of theinterposer 660 and a metal layer 632 of a semiconductor die 630, whichwill later be described.

In the performing of the reflow process, as illustrated in FIG. 15C, asemiconductor device 610 is reversed and positioned such that theconductive structures 650 (e.g., conductive bumps or balls, pillars,wires, etc.) face the conductive structures 663 of the interposer 660,and the reflow process is performed on the semiconductor device 610, thesemiconductor device 610 including a circuit board 620 having a firstcircuit pattern 622 formed on its top surface, a semiconductor die 630mounted on a top surface of the circuit board 620 and having a metallayer 632 formed thereon, an encapsulant 640 encapsulating thesemiconductor die 630 from an upper portion of the circuit board 620,and conductive structures 650 formed on the first circuit pattern 622and penetrating (e.g., extending partly through, extending completelythrough, extending completely through and beyond, etc.) the encapsulant640. Accordingly, as illustrated in FIG. 15D, the conductive structures650 of the semiconductor device 610 are welded (or otherwise attached)to the conductive structures 663 of the interposer 660. In addition, theheat radiating member 670 is cured between the semiconductor device 610and the interposer 660 and is electrically connected between the metallayer 632 and the conductive pad 664. Therefore, the heat radiatingmember 670 may transfer the heat generated from the semiconductor die630 to the interposer 660 to then be transferred (e.g., radiated,conducted, convected, etc.) to the outside. According to theabove-described fabricating method, the semiconductor package 800according to various aspects of the present disclosure can be formed.

Alternatively, after the performing of the reflow process, the method offabricating a semiconductor package according to still another exampleof the present disclosure may further include injecting an interlayermember in a space between the semiconductor device 610 and theinterposer 660. In addition, the method of fabricating a semiconductorpackage according to still another example of the present disclosure mayfurther include singulating (e.g., sawing, etc.) the panel typeinterposer 660, thereby forming a discrete semiconductor package 800.

FIG. 16 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure.

Referring to FIG. 16, the semiconductor package 900 according to stillanother example of the present disclosure includes a first semiconductordevice 110, a second semiconductor device 960, and an interlayer member170. For example, the semiconductor package 900 shown in FIG. 16 isdifferent from the semiconductor package 100 shown in FIG. 1 in that thesecond semiconductor device 960, instead of the interposer 160, isprovided. Accordingly, the following description will generally focus ononly differences between the semiconductor packages 100 and 900. Inaddition, since the first semiconductor device 110 of the semiconductorpackage 900 shown in FIG. 16 is the same as the semiconductor device 110of the semiconductor package 100 shown in FIG. 1, a detailed descriptionthereof will not be given. Note that the example semiconductor package900 may share any or all characteristics with any one or more othersemiconductor packages discussed herein.

The second semiconductor device 960 is mounted on the firstsemiconductor device 110. The second semiconductor device 960 includes acircuit board 970, a semiconductor die 980 and an encapsulant 990.

The circuit board 970 includes an insulating layer 971 having planar topand bottom surfaces, a first circuit pattern 972 formed on a top surfaceof the insulating layer 971, a second circuit pattern 973 formed on abottom surface of the insulating layer 971, and a passivation layer 974formed along outer peripheral edges of the first and second circuitpatterns 972 and 973 to a predetermined thickness. The circuit board 970may, for example, comprise a double-sided printed circuit board (PCB).Here, conductive structures 975 (e.g., conductive bumps or balls, solderballs, pillars, wires, etc.) are welded (or otherwise attached) to thesecond circuit pattern 973. The conductive structures 975 are connectedto a respective conductive structure 150 (e.g., a conductive bump orball, pillar, wire, etc.) of the first semiconductor device 110, therebyelectrically connecting the first semiconductor device 110 to the secondsemiconductor device 960.

The semiconductor die 980 is mounted on the circuit board 970. Thesemiconductor die 980 may, for example, be generally made of a siliconmaterial and have a plurality of semiconductor devices formed therein.In addition, a plurality of bond pads (not shown) are formed on thesemiconductor die 980 and a conductive wire 981 is connected to the bondpads. In addition, the conductive wire 981 is electrically connected tothe first circuit pattern 972 of the circuit board 970. For example, theconductive wire 981 electrically connects the semiconductor die 980 tothe circuit board 970.

The encapsulant 990 encapsulates the semiconductor die 980 and theconductive wire 981 from an upper portion of the circuit board 970.

The interlayer member 170 is formed between the first semiconductordevice 110 and the second semiconductor device 960. For example, theinterlayer member 170 is interposed between a top surface of thesemiconductor die 130 of the first semiconductor device 110 and a bottomsurface of the circuit board 970 of the second semiconductor device 960.In addition, the interlayer member 170 may be formed to cover theconductive structure 150 of the first semiconductor device 110 andlateral surfaces of the conductive structures 975 of the secondsemiconductor device 960. The interlayer member 170 may, for example, beformed of an epoxy flux or other material. In addition, the interlayermember 170 may be formed by injecting an epoxy resin, an epoxy moldingcompound (EMC), or other material into a space between the firstsemiconductor device 110 and the second semiconductor device 960.Further, the interlayer member 170 may also be formed of ananisotropically conductive paste (ACP).

FIG. 17 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure.

Referring to FIG. 17, the semiconductor package 1000 according to stillanother example of the present disclosure includes a semiconductordevice 110, an interposer 160 and an interlayer member 1070. Thesemiconductor package 1000 shown in FIG. 17 is different from thesemiconductor package 200 shown in FIG. 2 in that the first interlayermember part 271 is not provided. Accordingly, the following descriptionwill generally focus on only differences between the semiconductorpackages 200 and 1000. Note that the example semiconductor package 1000may share any or all characteristics with any one or more othersemiconductor packages discussed herein.

The interlayer member 1070 is formed between the semiconductor device110 and the interposer 160. For example, the interlayer member 1070 isformed between the semiconductor device 110 without the conductivestructures 150 and conductive structures 163, and the interposer 160.For example, the interlayer member 1070 is formed between thesemiconductor die 130 and the interposer 160 and between an encapsulant140 and the interposer 160. In addition, the interlayer member 1070 may,for example, be formed of a general adhesive, such as an epoxy resin, anepoxy molding compound (EMC), etc. The interlayer member 1070 maytransfer the heat generated from the semiconductor die 130 to theinterposer 160 to then be transferred (e.g., radiated, conducted,convected, etc.) to the outside. In addition, the interlayer member 1070may improve bondability between the semiconductor device 110 and theinterposer 160.

FIG. 18 is a cross-sectional view illustrating an example semiconductorpackage in accordance with various aspects of the present disclosure.

Referring to FIG. 18, the semiconductor package 1100 according to stillanother example of the present disclosure includes a semiconductordevice 110, an interposer 1160, and an interlayer member 1170. Thesemiconductor package 1100 shown in FIG. 18 is substantially the same asthe semiconductor package 100 shown in FIG. 1. Accordingly, thefollowing description will generally focus on only differences betweenthe semiconductor packages 100 and 1100. Note that the examplesemiconductor package 1100 may share any or all characteristics with anyone or more other semiconductor packages discussed herein.

The interposer 1160 is mounted on the semiconductor device 110. Theinterposer 1160 includes an insulator 161 having planar top and bottomsurfaces, and a circuit pattern 162 formed on a bottom surface of theinsulator 161. In addition, the interposer 1160 may also include acircuit pattern formed on a top surface of the insulator 161 so as tostack semiconductor devices, such as memory chips or logic chips,thereon. The circuit pattern 162 formed on the bottom surface of theinsulator 161 is electrically connected to the conductive structure 150of the semiconductor device 110. For example, when the interposer 1160is mounted on the semiconductor device 110, the conductive structure 150is welded (or otherwise attached) to the circuit pattern 162 toelectrically connect the interposer 1160 and the semiconductor device110 to each other. Therefore, the bottom surface of the interposer 1160may be brought into direct contact with a top surface of thesemiconductor die 131. The interposer 1160 may, for example, comprise asilicon substrate, a printed circuit board (PCB), etc.

The interlayer member 1170 is formed between the semiconductor device110 and the interposer 1160. For example, the interlayer member 1170 maybe formed in a through via 141 of the encapsulant 140 to surround theconductive bump 150. The interlayer member 1170 may, for example, beformed of an epoxy flux or other material. The epoxy flux may, forexample, be applied to surrounding areas of the conductive structure150, thereby improving adhesion between the conductive structure 150 andthe circuit pattern 162. In addition, the interlayer member 1170 may beformed by injecting an epoxy resin, an epoxy molding compound (EMC), orother material, into a portion between the semiconductor device 110 andthe interposer 1160. Further, the interlayer member 1170 may also beformed of an anisotropically conductive paste (ACP).

In summary, various aspects of this disclosure provide a semiconductordevice or package structure and a method for fabrication thereof. Whilethe foregoing has been described with reference to certain aspects andexamples, it will be understood by those skilled in the art that variouschanges may be made and equivalents may be substituted without departingfrom the scope of the disclosure. In addition, many modifications may bemade to adapt a particular situation or material to the teachings of thedisclosure without departing from its scope. Therefore, it is intendedthat the disclosure not be limited to the particular example(s)disclosed, but that the disclosure will include all examples fallingwithin the scope of the appended claims.

1. A semiconductor package comprising: a semiconductor devicecomprising: a substrate comprising a first substrate surface, a secondsubstrate surface opposite the first substrate surface, a plurality ofside substrate surfaces between the first and second substrate surfaces,and a substrate circuit pattern on the first substrate surface; asemiconductor die mounted on the first substrate surface, thesemiconductor die comprising a first die surface, a second die surfaceopposite the first die surface and facing the first substrate surface,and a plurality of side die surfaces between the first and second diesurfaces; and an encapsulant comprising a first encapsulant surface anda second encapsulant surface opposite the first encapsulant surface andfacing the substrate, where the encapsulant encapsulates at least theside die surfaces and at least a portion of the first substrate surface,and where the encapsulant comprises a through via that extends from thefirst encapsulant surface to the second encapsulant surface and exposesthe substrate circuit pattern through the encapsulant; an interposermounted on the semiconductor device and comprising a first interposersurface, a second interposer surface opposite the first interposersurface and facing the semiconductor device, and an interposer circuitpattern formed on the second interposer surface; one or more conductivestructures that extend through the through via and electrically couplethe interposer circuit pattern to the substrate circuit pattern; and aninterlayer member between the semiconductor device and the interposer.2. The semiconductor package of claim 1, wherein the one or moreconductive structures comprise a first conductive structure connected tothe substrate circuit pattern, and a second conductive structureconnected to the interposer circuit pattern.
 3. The semiconductorpackage of claim 1, wherein the interlayer member comprises one or moreof: an epoxy flux, an epoxy resin, an epoxy molding compound (EMC),and/or an anisotropically conductive paste (ACP).
 4. The semiconductorpackage of claim 1, wherein the interlayer member comprises: a firstinterlayer member portion that covers the one or more conductivestructures; and a second interlayer member portion between thesemiconductor die and the interposer.
 5. The semiconductor package ofclaim 4, wherein: the first interlayer member portion comprises a firstinterlayer member part made from a first type of material; and thesecond interlayer member portion comprises a second interlayer memberpart made from a second type of material that is different from thefirst type of material.
 6. The semiconductor package of claim 5, whereinthe first interlayer member part comprises epoxy flux, and the secondinterlayer member part comprises an adhesive.
 7. The semiconductorpackage of claim 4, wherein the second interlayer member portion is alsobetween the encapsulant and the interposer.
 8. The semiconductor packageof claim 4, comprising a gap between the first interlayer member portionand the second interlayer member portion.
 9. The semiconductor packageof claim 1, comprising a heat radiating member between the semiconductordie and the interposer.
 10. The semiconductor package of claim 4,wherein a first end of the second interlayer member portion extends to afirst side of the semiconductor package, and a second end of the secondinterlayer member portion extends to a second side of the semiconductorpackage.
 11. The semiconductor package of claim 1, comprising a circuitpattern on the first interposer surface for coupling to a semiconductordie.
 12. The semiconductor package of claim 1, comprising a secondsemiconductor die mounted to the circuit pattern on the first interposersurface.
 13. A semiconductor package comprising: a semiconductor devicecomprising: a substrate comprising a first substrate surface, a secondsubstrate surface opposite the first substrate surface, a plurality ofside substrate surfaces between the first and second substrate surfaces,and a substrate circuit pattern on the first substrate surface; asemiconductor die mounted on the first substrate surface, thesemiconductor die comprising a first die surface, a second die surfaceopposite the first die surface and facing the first substrate surface,and a plurality of side die surfaces between the first and second diesurfaces; and an encapsulant comprising a first encapsulant surface anda second encapsulant surface opposite the first encapsulant surface andfacing the substrate, where the encapsulant encapsulates at least theside die surfaces and at least a portion of the first substrate surface,and where the encapsulant comprises a through via that extends from thefirst encapsulant surface to the second encapsulant surface and exposesthe substrate circuit pattern through the encapsulant; an interposermounted on the semiconductor device and comprising a first interposersurface, a second interposer surface opposite the first interposersurface and facing the semiconductor device, and an interposer circuitpattern formed on the second interposer surface; one or more conductivestructures that extend through the through via and electrically couplethe interposer circuit pattern to the substrate circuit pattern; and aninterlayer member between the semiconductor device and the interposer,where the interlayer member comprises: a first interlayer member portionthat extends from the encapsulant to the interposer; and a secondinterlayer member portion, different from the first interlayer memberportion, that extends from the semiconductor die to the interposer. 14.The semiconductor package of claim 13, wherein: the first interlayermember portion comprises a first interlayer member part made from afirst type of material; and the second interlayer member portioncomprises a second interlayer member part made from a second type ofmaterial that is different from the first type of material.
 15. Thesemiconductor package of claim 13, wherein the first interlayer memberportion comprises a first interlayer member part that contacts the oneor more conductive structures.
 16. The semiconductor package of claim13, wherein the first interlayer member portion is separated from thesecond interlayer member portion. 17-20. (canceled)
 21. A semiconductorpackage comprising: a semiconductor device comprising: a substratecomprising a first substrate surface, a second substrate surfaceopposite the first substrate surface, a plurality of side substratesurfaces between the first and second substrate surfaces, and asubstrate circuit pattern on the first substrate surface; asemiconductor die mounted on the first substrate surface, thesemiconductor die comprising a first die surface, a second die surfaceopposite the first die surface and facing the first substrate surface,and a plurality of side die surfaces between the first and second diesurfaces; and an encapsulant comprising a first encapsulant surface, asecond encapsulant surface opposite the first encapsulant surface andfacing the substrate, and a plurality of side encapsulant surfacesbetween the first and second encapsulant surfaces, where the encapsulantencapsulates at least the side die surfaces and at least a portion ofthe first substrate surface, and where the encapsulant comprises athrough via that extends from the first encapsulant surface to thesecond encapsulant surface and exposes the substrate circuit patternthrough the encapsulant; an interposer mounted on the semiconductordevice and comprising a first interposer surface, a second interposersurface opposite the first interposer surface and facing thesemiconductor device, and an interposer circuit pattern formed on thesecond interposer surface; one or more conductive structures that extendthrough the through via and electrically couple the interposer circuitpattern to the substrate circuit pattern; and an interlayer memberbetween the semiconductor device and the interposer, wherein theinterlayer member comprises a first material that extends to a firstside of the semiconductor package and to a second side of thesemiconductor package.
 22. The semiconductor package of claim 21,wherein the first material covers the semiconductor die and theencapsulant.
 23. The semiconductor package of claim 22, wherein theinterlayer member contacts the conductive structures.
 24. Thesemiconductor package of claim 23, wherein the interlayer membercomprises a second material, different from the first material, thatcontacts the conductive structures.